Web3.2.1 Focus Effects and Process Window. The effect of focus on a projection lithography system is a critical part in understanding and controlling a lithographic process. The depth of focus and the process … Web23 aug. 2024 · DoF는 그 값이 클수록 일정하게 노광할 수 있는 범위가 커지는 것으로 노광의 정확도가 증가하는 것이므로 클수록 좋다. Resolution과 DoF는 같은 파라미터를 가지고 구성되지만 DoF는 클수록 좋고 Resolution은 작으면 …
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